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Spin coater

Description

The SPIN150i is a single wafer spin coater designed for R&D and low volume production in the fields of e.g. MEMS, semiconductors, PV, and microfluidics.

This equipment is located at Surfix (Plus Ultra, Bronland 12, Wageningen Campus). 

Technical Details

The spin coater is suitable for processing fragments as small as 5 mm up to 6’’ (round) substrates. It is programmable and can be used for spin recipes with multiple steps, including puddle spin coating (alternating clockwise and counterclockwise rotation).

Specifications:
• maximum spin speed 21,000 rpm;
• maximum acceleration 30,000 rpm/sec .

Applications

Suitable for all typical spin processes:
• cleaning;
• rinse/dry;
• coating;
• developing;
• etching.

 



Last edited by Oscar de Vos on 2022-02-01

Our expert(s)
Wout Knoben
Contact our expert(s)
Brand

SPS Europe

Type

SPIN150i

Organisation

Surfix BV
Shared Research Facilities

Department

Surfix BV



To explore the potential of nature to improve the quality of life.

This Shared Research Facilities equipment database offers researchers from universities, research institutes and companies, including start-ups, the opportunity to find research equipment with their relevant expert and to use it, generally on a pay-per-use basis. The equipment is available at different locations at Wageningen Campus or other (company) locations. If you want to share your own research devices or if you need more information, please contact us.