Description
The SPIN150i is a single wafer spin coater designed for R&D and low volume production in the fields of e.g. MEMS, semiconductors, PV, and microfluidics.
This equipment is located at Surfix (Plus Ultra, Bronland 12, Wageningen Campus).
Technical Details
The spin coater is suitable for processing fragments as small as 5 mm up to 6’’ (round) substrates. It is programmable and can be used for spin recipes with multiple steps, including puddle spin coating (alternating clockwise and counterclockwise rotation).
Specifications:
• maximum spin speed 21,000 rpm;
• maximum acceleration 30,000 rpm/sec
.
Applications
Suitable for all typical spin processes:
• cleaning;
• rinse/dry;
• coating;
• developing;
• etching.