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ATTO low pressure plasma system


In the low-pressure plasma technology, gas is excited in a vacuum by supplying electrical energy. This results in energetic ions and electrons, as well as other reactive particles, which constitute the plasma. Surfaces can then be effectively altered.

There are three plasma effects:

  • physical removal of material by ion bombardment;
  • chemical reaction of the ionized gas with the surface;
  • UV radiation breaks down long-chain carbon compounds.

The effect of the plasma changes by varying the process parameters such as pressure, power, process time, gas flow and composition.

This equipment is located at Surfix (Plus Ultra, Bronland 12, Wageningen Campus). 

Technical Details

Generator: 13.56 MHz / 50 W fixed matching


  • material: glass
  • volume: 10.5 litres (diameter 211 mm, length 300 mm)

Vacuum pump: scroll pump (Edwards nXDS)

Gas supply

  • 2 gas channels via needle valves
  • process gases: air, oxygen, argon, nitrogen

Control: manual, process time via analogue timer


Plasma is used in areas where it matters to change the surface properties of materials. It is possible to modify virtually any surface with this technology. The main applications of plasma treatment are:

  • Cleaning;
  • Activation;
  • Etching;
  • Deposition.

Last edited by Oscar de Vos on 2022-02-01

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Surfix BV
Shared Research Facilities


Surfix BV

To explore the potential of nature to improve the quality of life.

This Shared Research Facilities equipment database offers researchers from universities, research institutes and companies, including start-ups, the opportunity to find research equipment with their relevant expert and to use it, generally on a pay-per-use basis. The equipment is available at different locations at Wageningen Campus or other (company) locations. If you want to share your own research devices or if you need more information, please contact us.