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Collimated UV light source system

Description

In photolithography and related applications, it is important that the light intensity is uniform over the entire substrate surface and constant in time. This can be achieved by generating a collimated light beam using mirrors and lenses. This light source generates a uniform beam of UV light with a diameter of 150 mm (6’’) and an intensity of approximately 10 mW/cm2 (at 260 nm).

This equipment is located at Surfix (Plus Ultra, Bronland 12, Wageningen Campus).

Technical Details

Light source: 1000 W Hg/Xe lamp

Mirror sets

  • DUV (260 nm);
  • MUV (310 nm).

Beam parameters

  • diameter: 150 mm (6");
  • divergence: ≤ 2 o

Control

  • intensity controlling power supply system;
  • programmable shutter.

Applications

  • photoresist patterning;
  • photocurable coatings.


Last edited by Oscar de Vos on 2022-02-01

Our expert(s)
Wout Knoben
Contact our expert(s)
Brand

Bachur & Associates

Type

LS-150X-10

Organisation

Surfix BV
Shared Research Facilities

Department

Surfix BV



To explore the potential of nature to improve the quality of life.

This Shared Research Facilities equipment database offers researchers from universities, research institutes and companies, including start-ups, the opportunity to find research equipment with their relevant expert and to use it, generally on a pay-per-use basis. The equipment is available at different locations at Wageningen Campus or other (company) locations. If you want to share your own research devices or if you need more information, please contact us.