Description
In photolithography and related applications, it is important that the light intensity is uniform over the entire substrate surface and constant in time. This can be achieved by generating a collimated light beam using mirrors and lenses. This light source generates a uniform beam of UV light with a diameter of 150 mm (6’’) and an intensity of approximately 10 mW/cm2 (at 260 nm).
This equipment is located at Surfix (Plus Ultra, Bronland 12, Wageningen Campus).
Technical Details
Light source: 1000 W Hg/Xe lamp
Mirror sets
- DUV (260 nm);
- MUV (310 nm).
Beam parameters
- diameter: 150 mm (6");
- divergence: ≤ 2 o
Control
- intensity controlling power supply system;
- programmable shutter.
Applications
- photoresist patterning;
- photocurable coatings.